000 01553cam a22003851i 4500
001 20775460
005 20230829123748.0
006 m |o d |
007 cr_|||||||||||
008 181211s2019 nju ob 001 0 eng
010 _a 2018059153
020 _a9781119355007 (Adobe PDF)
020 _a9781119355021 (ePub)
020 _z9781119355014 (hardcover)
040 _aDLC
_beng
_erda
_cDLC
_dDLC
042 _apcc
050 0 0 _aQC611.6.M64 2019
082 0 0 _a621.3815/2
_223
245 0 0 _aMolecular beam epitaxy :
_bmaterials and applications for electronics and optoelectronics /
_cedited by Hajime Asahi (ISIR, Osaka University, Japan), Yoshiji Horikoshi (Waseda University, Tokyo, Japan).
260 _aHoboken, NJ, :
_bJohn Wiley & Sons, Inc.,
_c2019
300 _a1 online resource. 481p. :
_bill. ;
_g28cm.
490 0 _aWiley series in materials for electronic and optoelectronic applications
504 _aIncludes bibliographical references and index.
650 0 _aMolecular beam epitaxy.
650 0 _aEpitaxy.
650 0 _aCrystal growth.
650 0 _aElectronics
_xMaterials.
650 0 _aOptoelectronics
_xMaterials.
700 1 _aAsahi, Hajime,
_d1948-
_eeditor.
700 1 _aHorikoshi, Yoshiji,
_d1943-
_eeditor.
776 0 8 _iPrint version:
_tMolecular beam epitaxy
_bFirst edition.
_dHoboken, NJ : Wiley, 2019
_z9781119355014
_w(DLC) 2018044564
906 _a7
_bcbc
_corigcop
_d1
_eecip
_f20
_gy-gencatlg
942 _2lcc
_hQC611.6.M64 2019
_cBOOKS
999 _c31844
_d31844